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Formation of VN from VCl 4 and NH(SiMe 3 ) 2 by APCVD − a Potential Solar Control Coating
Author(s) -
Newport Anne,
Carmalt Claire J.,
Parkin Ivan P.,
O’Neill Shane A.
Publication year - 2004
Publication title -
european journal of inorganic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.667
H-Index - 136
eISSN - 1099-0682
pISSN - 1434-1948
DOI - 10.1002/ejic.200400344
Subject(s) - x ray photoelectron spectroscopy , chemistry , vanadium , thin film , solar cell , substrate (aquarium) , chloride , analytical chemistry (journal) , nitride , stylus , vanadium nitride , titanium , chemical engineering , inorganic chemistry , nanotechnology , organic chemistry , optoelectronics , layer (electronics) , materials science , oceanography , geology , engineering , computer science , operating system
Vanadium nitride thin films have been synthesised by the reaction of vanadium( IV ) chloride with hexamethyldisilazane (HMDS) under atmospheric pressure (AP)CVD conditions at 300−550 °C. The films deposited have good optical characteristics and low electrical resistivities. These films were not scratched off the glass substrate by a steel stylus and were not degraded by immersion in a range of solvents. X‐ray diffraction showed an NaCl‐type cubic cell with a = 4.102(1)−4.127(1) Å, dependent on the sample. X‐ray photoelectron spectroscopy shows that the films have a V/N ratio close to unity. For comparison, films were also deposited by the APCVD reaction of VOCl 3 with HMDS. These films consist of mixed phases of vanadium oxynitride and V 2 O 3 . The VN films show properties suitable for use as solar control coatings. (© Wiley‐VCH Verlag GmbH & Co. KGaA, 69451 Weinheim, Germany, 2004)
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