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Preparation of stoichiometric KTa 1‐x Nb x O 3 films by RF sputtering
Author(s) -
Fukami Tatsuo,
Tsuchiya Hidetoshi
Publication year - 1977
Publication title -
electrical engineering in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.136
H-Index - 28
eISSN - 1520-6416
pISSN - 0424-7760
DOI - 10.1002/eej.4390970303
Subject(s) - computer science , stoichiometry , sputtering , citation , materials science , nanotechnology , world wide web , chemistry , thin film
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