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Electrical characteristics of amorphous semiconductor thin film of As‐Te‐Ge‐Si system
Author(s) -
Miyazono T.,
Shiraishi T.,
Kurosu T.,
Iida M.
Publication year - 1975
Publication title -
electrical engineering in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.136
H-Index - 28
eISSN - 1520-6416
pISSN - 0424-7760
DOI - 10.1002/eej.4390950403
Subject(s) - engineering physics , citation , library science , amorphous semiconductors , engineering , materials science , computer science , nanotechnology , thin film
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