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Microfabrication of polytetrafluoroethylene using SR direct etching
Author(s) -
Yamamoto Shigeaki,
Ukita Yoshiaki,
Mochiji Kozo,
Utsumi Yuichi
Publication year - 2012
Publication title -
electrical engineering in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.136
H-Index - 28
eISSN - 1520-6416
pISSN - 0424-7760
DOI - 10.1002/eej.21152
Subject(s) - microfabrication , polytetrafluoroethylene , materials science , etching (microfabrication) , surface micromachining , fabrication , synchrotron radiation , microfluidics , isotropic etching , bulk micromachining , nanotechnology , optoelectronics , composite material , optics , medicine , alternative medicine , pathology , layer (electronics) , physics
Polytetrafluoroethylene (PTFE) is a very attractive material for various fields because of its chemical resistance, insulation properties, and hydrophobic properties. However, it is difficult to fabricate PTFE microstructures with conventional techniques such as semiconductor processes or micromachining. We have succeeded in the fabrication of high‐aspect‐ratio microfluidics parts from PTFE by direct in‐vacuum photo‐etching utilizing synchrotron radiation (SR) at energy levels from 2 to 12 keV. This paper presents an analysis of the mechanisms of the PTFE microfabrication process and describes newly discovered processing characteristics of PTFE. © 2011 Wiley Periodicals, Inc. Electr Eng Jpn, 178(4): 49–54, 2012; Published online in Wiley Online Library ( wileyonlinelibrary.com ). DOI 10.1002/eej.21152