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Pulsed discharge purification of water containing nondegradable hazardous substances
Author(s) -
Miyazaki Yasushi,
Satoh Kohki,
Itoh Hidenori
Publication year - 2010
Publication title -
electrical engineering in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.136
H-Index - 28
eISSN - 1520-6416
pISSN - 0424-7760
DOI - 10.1002/eej.20937
Subject(s) - phenol , decomposition , aqueous solution , chemistry , radical , corona discharge , metastability , analytical chemistry (journal) , excited state , electrode , chromatography , organic chemistry , atomic physics , physics
We investigate the decomposition characteristics of phenol in an aqueous solution under exposure to pulsed discharge plasma. The investigation is carried out with different electrode configurations, applied voltages, and humidity levels and compositions of the background gas. It is possible that in the case of all gases, OH radicals are responsible for the decomposition of phenol in the solution. In pure O 2 , the decomposition rate of phenol increases due to the generation of O and O 3 . In pure N 2 , OH radicals produced by N 2 , which is excited in the metastable state, contribute to phenol decomposition. In N 2 ‐O 2 , the decomposition rate of phenol remains low, and the NO x produced by the pulsed plasma in a N 2 ‐O 2 mixture destroys O 3 , and the production of the NO x inhibits O 3 production. In Ar‐O 2 , the decomposition rate of phenol increases with an increase in the concentration of Ar in the mixture. It is possible that excited Ar atoms are responsible for the decomposition of phenol in the solution at higher concentrations of Ar in Ar‐O 2 . Further, it is found that the decomposition rate of phenol in aqueous solution exposed to a pulsed discharge is almost the same as that of phenol in aqueous solution exposed to a DC corona discharge. © 2010 Wiley Periodicals, Inc. Electr Eng Jpn, 174(2): 1–8, 2011; Published online in Wiley Online Library ( wileyonlinelibrary.com ). DOI 10.1002/eej.20937