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Proposal of next‐generation three‐dimensional X‐ray lithography and its application to fabrication of a high‐luminescence optical waveguide for a liquid crystal backlight unit
Author(s) -
Utsumi Yuichi,
Kishimoto Takefumi,
Hattori Tadashi,
Minamitani Megumi
Publication year - 2008
Publication title -
electrical engineering in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.136
H-Index - 28
eISSN - 1520-6416
pISSN - 0424-7760
DOI - 10.1002/eej.20680
Subject(s) - backlight , lithography , liga , x ray lithography , optics , materials science , synchrotron radiation , photolithography , waveguide , fabrication , luminescence , next generation lithography , optoelectronics , liquid crystal display , physics , electron beam lithography , nanotechnology , resist , medicine , alternative medicine , pathology , layer (electronics)
We have developed a new 3D X‐ray lithography system for LIGA processing using synchrotron radiation at the New SUBARU facility of the University of Hyogo. The X‐ray lithography system can utilize two different energy regions; one is a high‐energy region from 3 keV to 10 keV, and the other is a low‐energy region from 0.1 to 2 keV. Each energy region can be selected in accordance with the size and shape of the desired microstructures. It is demonstrated that a large‐area high‐luminance 7‐inch optical waveguide for the liquid crystal backlight unit was successfully fabricated with this X‐ray lithography method. © 2008 Wiley Periodicals, Inc. Electr Eng Jpn, 165(1): 52–59, 2008; Published online in Wiley InterScience ( www.interscience. wiley.com ). DOI 10.1002/eej.20680