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Deposition of boron carbide powder by a pulsed high‐current arc plasma
Author(s) -
Kitamura Junya,
Usuba Shu
Publication year - 2004
Publication title -
electrical engineering in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.136
H-Index - 28
eISSN - 1520-6416
pISSN - 0424-7760
DOI - 10.1002/eej.20005
Subject(s) - boron carbide , materials science , plasma , coaxial , arc (geometry) , boron , carbide , thermal spraying , current (fluid) , metallurgy , dense plasma focus , high speed steel , deposition (geology) , analytical chemistry (journal) , composite material , electrical engineering , chemistry , coating , nuclear physics , physics , paleontology , geometry , mathematics , sediment , biology , chromatography , engineering
A novel high‐velocity thermal spraying was experimentally investigated using a pulsed high‐current electromagnetically accelerated arc plasma. By spraying boron carbide (B 4 C) powder with a pulsed high‐current arc plasma of 10 5 A in a coaxial plasma gun, a dense deposit of crystalline B 4 C with a Vickers hardness of 2600 kgf/mm 2 was obtained on SUS304 substrates. The impact velocity of the sprayed B 4 C particles was thought to be more than 2.5 km/s for powder less than 10 µm in diameter and about 2 km/s for that of 30 ± 10 µm. © 2004 Wiley Periodicals, Inc. Electr Eng Jpn, 149(1): 1–7, 2004; Published online in Wiley InterScience ( www.interscience.wiley.com ). DOI 10.1002/eej.20005