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Fabrication and evaluation of LaCrO 3 thin film heaters
Author(s) -
Hayashi Shinichiro,
Sofue Satoshi,
Yoshikado Shinzo
Publication year - 2002
Publication title -
electrical engineering in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.136
H-Index - 28
eISSN - 1520-6416
pISSN - 0424-7760
DOI - 10.1002/eej.1156
Subject(s) - materials science , quartz , thin film , sputtering , substrate (aquarium) , crystal (programming language) , fabrication , sputter deposition , doping , analytical chemistry (journal) , lanthanum , optoelectronics , composite material , nanotechnology , inorganic chemistry , chemistry , medicine , oceanography , alternative medicine , pathology , chromatography , geology , computer science , programming language
Lanthanum chromium oxide (LaCrO 3 ) has excellent high‐temperature properties. LaCrO 3 doped with alkaline earth metals also has high electric conductivity. The purpose of this study is to fabricate thin film heaters using LaCrO 3 doped with Ca by RF magnetron sputtering method. The crystal structure of thin films was evaluated and the surface form was studied. The results show that the thin film deposited on Si(100) single crystal and quartz glass substrates in Ar gas had a strong orientation and that its surface form was comparatively smooth. The crystal structure of the thin films deposited on Si(100) and quartz glass substrate at temperatures of 700 and 800 °C by sputtering in a mixture of Ar and O 2 gases was the same as the crystal structure of LaCrO 3 . The heating characteristics of a thin film heater on Si(100) substrate with Pt electrodes were evaluated by measurement of the equilibrium temperature‐current (T–I) and resistance‐equilibrium temperature (R–T) characteristics. The maximum equilibrium heating temperature was about 1100 °C. © 2002 Wiley Periodicals, Inc. Electr Eng Jpn, 139(3): 18–25, 2002; Published online in Wiley InterScience ( www.interscience.wiley.com ). DOI 10.1002/eej.1156