Premium
Plasma‐on‐Chip : device for non‐thermal atmospheric pressure plasma irradiation to single cells
Author(s) -
Kumagai Shinya,
Kobayashi Mime,
Shimizu Tetsuji,
Sasaki Minoru
Publication year - 2020
Publication title -
electronics and communications in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.131
H-Index - 13
eISSN - 1942-9541
pISSN - 1942-9533
DOI - 10.1002/ecj.12263
Subject(s) - plasma , irradiation , materials science , dielectric barrier discharge , chip , atmospheric pressure plasma , optoelectronics , dielectric , microplasma , dense plasma focus , power consumption , atmospheric pressure , nonthermal plasma , power (physics) , electrical engineering , physics , engineering , quantum mechanics , meteorology , nuclear physics
We report an improvement of the Plasma‐on‐Chip device that enables plasma irradiation to single cells. Dielectric barrier discharge structure was introduced and power consumption was reduced to 200 µW. The modification extended the operation time of the Plasma‐on‐Chip device. As long as 10 min plasma irradiation to yeast cells, Saccharomyces cerevisiae was conducted.