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IR absorption spectroscopy of deposition process of amorphous carbon film due to ethylene plasma
Author(s) -
Shinohara Masanori,
Tominaga Taisuke,
Shimomura Hayato,
Ihara Takeshi,
Yagyu Yoshihito,
Ohshima Tamiko,
Kawasaki Hiroharu
Publication year - 2019
Publication title -
electronics and communications in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.131
H-Index - 13
eISSN - 1942-9541
pISSN - 1942-9533
DOI - 10.1002/ecj.12159
Subject(s) - ethylene , hydrocarbon , analytical chemistry (journal) , infrared spectroscopy , absorption spectroscopy , amorphous carbon , materials science , absorption (acoustics) , amorphous solid , plasma , carbon film , methane , deposition (geology) , dangling bond , hydrogen , carbon fibers , spectroscopy , thin film , chemistry , organic chemistry , composite number , nanotechnology , optics , paleontology , physics , quantum mechanics , composite material , biology , catalysis , sediment
Abstract Changes in chemical states of amorphous carbon film during ethylene (C 2 H 4 ) plasma in the floating potential were investigated with multiple‐internal‐reflection infrared absorption spectroscopy (MIR‐IRAS) and deposition rates. IRAS spectra showed that the peaks due to the sp 3 ‐CH X were observed, but no peaks due to sp 2 ‐CH X were observed. The deposition rate due to ethylene plasma was nearly twice that due to methane plasma, in the same way that the number of carbons in an ethylene molecule is twice as that in a methane molecule. It is suggested that the film growth due to ethylene plasma is the same manner of that due to methane plasma; the plasma‐generated hydrocarbon species such as C 2 H 3 and C 2 H 5 , which are generated in ethylene plasma, are adsorbed on dangling bonds that are generated by hydrogen abstraction from the deposited film surface. As a result, the deposited film is composed of sp 3 ‐hydrocarbon components.