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Deposition of hydrophilic amorphous carbon film with ether as a source molecule and analysis of its deposition reaction
Author(s) -
Shinohara Masanori,
Tominaga Taisuke,
Shimomura Hayato,
Ihara Takeshi,
Yagyu Yoshihito,
Ohshima Tamiko,
Kawasaki Hiroharu
Publication year - 2019
Publication title -
electronics and communications in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.131
H-Index - 13
eISSN - 1942-9541
pISSN - 1942-9533
DOI - 10.1002/ecj.12157
Subject(s) - molecule , amorphous carbon , deposition (geology) , amorphous solid , hydrocarbon , carbon film , ether , chemical vapor deposition , carbon fibers , materials science , chemical engineering , isopropyl alcohol , carbon source , thin film , organic chemistry , chemistry , nanotechnology , composite material , composite number , geology , paleontology , sediment , engineering , biochemistry
A hydrophilic amorphous carbon film was deposited with plasma‐enhanced chemical vapor deposition using diisopropylether ((i‐C 3 H 7 ) 2 O) as a source molecule. Bonding states of hydrocarbon in the deposited film are comprised of sp 3 ‐hydrocarbon components, which is the same as the isopropyl group in the source molecule. On the other hand, C═O bonding is formed in the deposited film, not as similar to the source molecule, diisopropylether. These results suggest that C─O─C in the source molecule would be cleaved. This study would propose a new deposition method of a hydrophilic amorphous carbon film with ether as a source molecule.