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Enhancement of Extreme Ultraviolet Emission Intensity from a Laser‐Produced Plasma Using an Alloy Target
Author(s) -
Kaku Masanori,
Matsuura Yuta,
Kubodera Shoichi
Publication year - 2014
Publication title -
electronics and communications in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.131
H-Index - 13
eISSN - 1942-9541
pISSN - 1942-9533
DOI - 10.1002/ecj.11540
Subject(s) - plasma , opacity , extreme ultraviolet , tungsten , ultraviolet , laser , alloy , materials science , emission intensity , intensity (physics) , plasma display , emission spectrum , optics , spectral line , atomic physics , optoelectronics , chemistry , physics , electrode , metallurgy , luminescence , astronomy , quantum mechanics
SUMMARY We observed that the emission intensity in the extreme and vacuum ultraviolet spectral regions using a laser‐produced copper–tungsten alloy plasma was 1.3 times higher than when using a pure tungsten plasma. The enhancement of the emission intensity was explained by the difference of the Rosseland mean opacity of each plasma.