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Plasma processing for carbon nanomaterials. Syntheses of nanostructures and their process control by numerical simulation of plasma
Author(s) -
Suda Yoshiyuki,
Takikawa Hirofumi,
Tanoue Hideto
Publication year - 2013
Publication title -
electronics and communications in japan
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.131
H-Index - 13
eISSN - 1942-9541
pISSN - 1942-9533
DOI - 10.1002/ecj.11504
Subject(s) - carbon nanotube , nanomaterials , fullerene , plasma , carbon fibers , materials science , nanotechnology , chemical vapor deposition , raw material , chemistry , physics , organic chemistry , composite material , quantum mechanics , composite number
Abstract Plasma is a useful tool to synthesize carbon nanomaterials, including diamonds, fullerenes, nanotubes, and graphenes. This review gives an overview of these carbon nanomaterials produced by thermal or nonthermal plasmas and of the authors' work related to plasma‐enhanced chemical vapor deposition of carbon nanotubes, along with an analysis and numerical simulation of CH 4 /H 2 feedstock gas plasmas. The amount of carbon atoms in the grown carbon nanotubes and that calculated by simulation showed good agreement. © 2013 Wiley Periodicals, Inc. Electron Comm Jpn, 96(6): 1–8, 2013; Published online in Wiley Online Library (wileyonlinelibrary.com). DOI 10.1002/ecj.11504