Open AccessCover image from A. M. Zhu and co‐workers ( Chem. Vap. Deposition 2014 , 20, 8)
Publication year - 2014
Publication title -
chemical vapor deposition
Language(s) - English
Resource type - Reports
eISSN - 1521-3862
pISSN - 0948-1907
DOI - 10.1002/cvde.201471231
Subject(s) - cover (algebra) , chemical vapor deposition , deposition (geology) , condensation , amorphous solid , hydrolysis , chemistry , image (mathematics) , chemical engineering , nanotechnology , computer science , materials science , physics , meteorology , crystallography , organic chemistry , geology , artificial intelligence , engineering , mechanical engineering , paleontology , sediment
Deposition of TiO 2 films at ambient temperature and pressure on moving substrates through facile and fast CVD is presented. This features the hydrolysis and condensation reactions of TTIP and water vapor. The as‐deposited film of amorphous TiO 2 enriched with OH groups results in very high photocatalytic activity under UV‐C light.