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Comparisons of physical and chemical sputtering in high density divertor plasmas with the Monte Carlo Impurity (MCI) transport model
Author(s) -
Evans T. E.,
Finkenthal D. F.,
Loh Y. S.,
Fenstermacher M. E.,
Porter G. D.,
West W. P.
Publication year - 1998
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.2150380139
Subject(s) - divertor , sputtering , plasma , materials science , carbon fibers , impurity , monte carlo method , atomic physics , tokamak , nuclear physics , physics , nanotechnology , thin film , composite material , statistics , mathematics , quantum mechanics , composite number
The MCI transport model was used to compare chemical and physical sputtering for a DIII‐D divertor plasma near detachment. With physical sputtering alone the integrated carbon influx was 8.4 × 10 19 neutrals/s while physical plus chemical sputtering produced an integrated carbon influx of 1.7 × 10 21 neutrals/s. The average carbon concentration in the computational volume increased from 0.012% with only physical sputtering to 0.182% with both chemical and physical sputtering. This increase in the carbon inventory produced more radiated power which is in better agreement with experimental measurements.