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Trends in the Plasma Activated Deposition of Hard Coatings
Author(s) -
Lunk A.
Publication year - 1991
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.2150310207
Subject(s) - plasma , deposition (geology) , materials science , chemical vapor deposition , plasma processing , chemical engineering , plasma enhanced chemical vapor deposition , nanotechnology , physics , nuclear physics , geology , paleontology , sediment , engineering
Plasma assisted deposition of hard coatings is a well‐known technique to improve the properties of bulk materials. From a detailed knowledge of the wear mechanisms and the characteristic properties of the coated materials there can be deduced the requirements to the deposition technique. These requirements are discussed in relation to the plasma parameters and the plasma ‐ surface interaction for the plasma assisted physical vapour deposition and the plasma assisted chemical vapour deposition.