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COmparison of Some Basic Plasma Parameters and Discharge Characteristics of Planar Magnetron Sputtering Discharges in Argon and Neon
Author(s) -
Petrov I.,
Ivanov I.,
Orlinov V.,
Kourtev J.
Publication year - 1990
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.2150300207
Subject(s) - neon , argon , materials science , atomic physics , plasma , plasma parameters , high power impulse magnetron sputtering , sputtering , cavity magnetron , sputter deposition , electric discharge in gases , physics , thin film , nanotechnology , nuclear physics , quantum mechanics
A comparative investigation is carried out of the discharge characteristics (current‐voltage characteristic and dependence of the running voltage on the gas pressure at constant discharge current), as well as of some plasma parameters (electron temperature, floating potential and plasma potential) and densities of the ion current extracted to the substrate, for discharges in neon and argon in a planar magnetron system for sputtering with a graphite target.