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Langmuir Probe Characterization of a RF Discharge Excited in Ar/C 2 F 3 Cl Mixtures during Plasma Deposition Processes
Author(s) -
Špatenka P.,
Šícha M.
Publication year - 1989
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.2150290108
Subject(s) - langmuir probe , materials science , plasma , ion , atomic physics , plasma diagnostics , impulse (physics) , excited state , analytical chemistry (journal) , plasma parameters , deposition (geology) , electron density , chemistry , physics , paleontology , organic chemistry , quantum mechanics , chromatography , sediment , biology
The apparatus for measurements of probe characteristic and its second derivative during plasma assisted thin film deposition is described. To avoid the probe surface contamination an impulse method combined with ion bombardment of the probe surface was used. Experimental evidence of the effectiveness of this method in the discharge fed with Ar/C 2 F 3 Cl mixtures is given. Measurements of the second derivative of the probe current have indicated an electron distribution different from the Maxwellian. Negative ions have been found in the discharge, the concentration of which has been estimated to be at most by one order of magnitude higher than the electron density.