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Electrostatic Probe Measurements in the Glow Discharge Plasma of a D. C. Magnetron Sputtering System
Author(s) -
Petrov I.,
Orlinov V.,
Ivanov I.,
Kourtev J.
Publication year - 1988
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.2150280207
Subject(s) - materials science , plasma , sputtering , ion , sputter deposition , plasma parameters , electron temperature , atomic physics , langmuir probe , substrate (aquarium) , high power impulse magnetron sputtering , cavity magnetron , electron density , graphite , analytical chemistry (journal) , plasma diagnostics , thin film , physics , nanotechnology , chemistry , nuclear physics , composite material , oceanography , quantum mechanics , geology , chromatography
The characteristics of the plasma surrounding the substrates in a planar magnetron sputtering system with a graphite target have been investigated by electrostatic probe measurements. The behaviour of the ion density n i and the electron temperature T e , determining the ion flux that can be extracted by the substrate, with the variation of the basic system parameters, has been studied.