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Sheath formation in the presence of non‐extensive electron distribution
Author(s) -
Moulick Rakesh,
Garg Anuj,
Kumar Mukesh
Publication year - 2021
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.202100047
Subject(s) - debye sheath , plasma , electron , range (aeronautics) , atomic physics , ion , plasma parameters , collision , boltzmann equation , physics , computational physics , materials science , nuclear physics , computer science , quantum mechanics , computer security , composite material
The main aim of this article is to recognize the sheath formation in the presence of non‐extensive electron distribution. The role of ion–neutral collision parameter K and the non‐extensive parameter “ q ” has been discussed. Existing literature suggests that the presence of non‐extensive electrons potentially modifies the plasma sheath behaviour. However, numerical calculations over the full plasma range, jointly addressing the sheath and presheath, are rare. Sheath formation, being a very fundamental phenomenon, deserves enough investigation in the region of non‐extensive distribution of particles. This study attempts to bridge the gap in understanding the formation of the sheath in collisional plasma in the light of both Boltzmann and q ‐distributed non‐extensive electrons.