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Effect of PSI on Momentum Input to Plasma‐Facing Material Surfaces
Author(s) -
Takamura S.,
Uesugi Y.,
Kuwabara T.
Publication year - 2016
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.201610061
Subject(s) - momentum (technical analysis) , plasma , reflection (computer programming) , sputtering , physics , cantilever , tension (geology) , atomic physics , materials science , mechanics , classical mechanics , nuclear physics , quantum mechanics , composite material , computer science , thin film , finance , moment (physics) , economics , programming language
A comprehensive formulation for momentum input to plasma‐facing material surfaces is newly tried, including a momentum increase due to ion reflection on surfaces with a new definition of momentum reflection coefficient, a momentum due to reaction of evaporated atoms, an increase due to physical sputtering, and the effect of plasma flow. Experimentally observed momentum input is evaluated with a simple formula as well as a mechanical cantilever model. In addition, the measurement with dial tension gauge in off‐plasma condition gives a total force, the value of which is compared with the above two estimations. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)