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Plasma‐Substrate Interaction during Plasma Deposition on Polymers
Author(s) -
Hegemann D.,
Hanselmann B.,
Blanchard N.,
Amberg M.
Publication year - 2014
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.201310064
Subject(s) - materials science , polymer , deposition (geology) , interphase , substrate (aquarium) , polyethylene terephthalate , plasma , adhesion , sputtering , chemical engineering , polymer substrate , thin film , nanotechnology , composite material , engineering , biology , geology , paleontology , oceanography , genetics , physics , quantum mechanics , sediment
The initial stage of film growth during plasma deposition on polymers determines many film properties such as morphology and structure, interphase formation and adhesion. Therefore, the plasma‐substrate interaction is investigated regarding the energy density during film growth, which is defined by the energy flux per depositing atom. The flux of film‐forming species and the flux of energetic particles were determined for metal sputtering (silver films) and plasma polymer deposition (amino‐functional hydrocarbon films). It is shown that enhanced energy densities can be obtained during the initial film growth due to reduced deposition rates and mixing with the polymer substrate (interphase formation). Thus, good adhesion on polymers such as polyethylene terephthalate (PET) has been achieved. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)