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Cover Picture: Contrib. Plasma Phys. 10/2012
Publication year - 2012
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.201290016
Subject(s) - cover (algebra) , plasma , line (geometry) , citation , physics , computer science , electron density , electron , power (physics) , atomic physics , nuclear physics , library science , quantum mechanics , mathematics , mechanical engineering , geometry , engineering
Line integrated electron density fluctuations in dependence on rf power and time for process pressure of 60 Pa. The mean line integrated electron density is subtracted. Figure 9 of the paper by C. K¨ullig et al (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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