Heat Flux Dependence of Ambipolar Potential and Plasma Profile in a Long Mean‐Free‐Path Plasma Along Non‐Uniform Open Magnetic Field Lines | Zendy

Guo Z. | Zendy; Tang X.Z. | Zendy

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Heat Flux Dependence of Ambipolar Potential and Plasma Profile in a Long Mean‐Free‐Path Plasma Along Non‐Uniform Open Magnetic Field Lines

Author(s) -

Guo Z.,

Tang X.Z.

Publication year - 2012

Publication title -

contributions to plasma physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.531

H-Index - 47

eISSN - 1521-3986

pISSN - 0863-1042

DOI - 10.1002/ctpp.201210043

Subject(s) - ambipolar diffusion , mean free path , plasma , heat flux , physics , magnetic field , condensed matter physics , flux (metallurgy) , perpendicular , convection , materials science , thermodynamics , heat transfer , optics , nuclear physics , geometry , mathematics , quantum mechanics , scattering , metallurgy

Parallel transport along an open magnetic field line produces and sustains temperature anisotropy for a long mean‐free‐path plasma. The parallel variation of ambipolar potential (Φ) and plasma profiles such as density ( n ), parallel and perpendicular temperature ( T ‖ and T ⊥ ), and parallel flow ( u ), is found to be critically dependent on the two distinct components of the parallel heat flux, q n and q s . Both their profile ( q n /B and q s /B 2 ) and the upstream values of the ratio of the conductive and convective thermal flux ( q n /nuT ‖ and q s /nuT ⊥ ) provide the controlling physics, in addition to B modulation (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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