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Measurements of SiH 4 /H 2 VHF Plasma Parameters with Heated Langmuir Probe
Author(s) -
Yamane T.,
Nakao S.,
Takeuchi Y.,
Muta H.,
Ichiki R.,
Uchino K.,
Kawai Y.
Publication year - 2013
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.201200125
Subject(s) - langmuir probe , silane , plasma , ion , langmuir , saturation current , materials science , saturation (graph theory) , plasma diagnostics , electron density , electron temperature , analytical chemistry (journal) , atomic physics , plasma parameters , chemistry , physics , adsorption , voltage , mathematics , organic chemistry , quantum mechanics , combinatorics , chromatography , composite material
The parameters of a SiH 4 /H 2 VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. It was found that when the sailane gas concentration is increased, the nagative ion density increases. Here the negative ion density was estimated from the reduction of the electron saturation current. In addition, the dependence of the wall potential on the silane gas concentration agreed with the theoretical values derived from the Bohm sheath equation including negative ions. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)