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Mass Spectrometric Investigations of Nano‐Size Cluster Ions Produced by High Pressure Magnetron Sputtering
Author(s) -
Ganeva M.,
Peter T.,
Bornholdt S.,
Kersten H.,
Strunskus T.,
Zaporojtchenko V.,
Faupel F.,
Hippler R.
Publication year - 2012
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.201200046
Subject(s) - sputter deposition , cavity magnetron , cluster (spacecraft) , materials science , sputtering , nano , high power impulse magnetron sputtering , ion , mass spectrometry , analytical chemistry (journal) , deposition (geology) , cluster size , quadrupole , atomic physics , nanotechnology , thin film , chemistry , physics , environmental chemistry , composite material , molecular dynamics , chromatography , computer science , biology , paleontology , programming language , computational chemistry , organic chemistry , sediment
A comparison of quadrupole mass spectrometric (QMS) and transmission electron microscopic (TEM) characterization of silver nano‐cluster deposition produced by a nano‐cluster source consisting of a planar DC magnetron sputter source in a high pressure gas aggregation chamber is presented and discussed. Cluster sizes and size distributions detected by the two different techniques are compared and the differences are discussed. The effects of He to Ar ratio, gas flow and magnetron power on the cluster size distribution are evaluated. The influence of the target erosion and aging effects are mentioned, too (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)