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Spatial Distribution of Plasma Parameters in DC‐Energized Hollow Cathode Plasma Jet
Author(s) -
Leshkov S.,
Kudrna P.,
Chichina M.,
Klusoň J.,
Picková I.,
Virostko P.,
Hubička Z.,
Tichý M.
Publication year - 2010
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.201010149
Subject(s) - langmuir probe , plasma , nozzle , materials science , cathode , argon , jet (fluid) , atomic physics , plasma parameters , electron , plasma diagnostics , electron density , analytical chemistry (journal) , chemistry , physics , mechanics , thermodynamics , quantum mechanics , chromatography
DC energized hollow cathode plasma jet system was examined by radially movable Langmuir probe. Radial distribution of electron concentration, plasma and floating potentials and mean electron energy were obtained from measured probe characteristics at the distance 17 mm downstream of the hollow cathode – nozzle. The radial dependence of plasma parameters was measured for distances from the system axis 0–120 mm in the discharge containing Ar and O2. Two scenarios were used: addition of O2 into the nozzle and into the plasma vessel. The differences in measured floating and plasma potential, electron density and mean electron energy radial courses obtained in the two scenarios are qualitatively explained. In addition temporal dependences of main plasma parameters for discharges in clean argon and argon‐oxygen mixture were investigated that demonstrate system stability and its applicability for deposition of layers containing Ti. TiO x thin films were deposited onto glass substrates and examined by AFM and ellipsometry. It is illustrated that the differences in plasma parameters in the two scenarios of oxygen addition influence the layer properties (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)