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GC‐MS Investigation of Organosilicon and Fluorocarbon Fed Plasmas
Author(s) -
Fanelli F.,
Fracassi F.,
Lovascio S.,
d'Agostino R.
Publication year - 2011
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.201000051
Subject(s) - organosilicon , fluorocarbon , plasma , dielectric barrier discharge , materials science , monomer , deposition (geology) , gas phase , chemical engineering , dielectric , analytical chemistry (journal) , polymer chemistry , organic chemistry , polymer , chemistry , composite material , optoelectronics , physics , nuclear physics , paleontology , sediment , engineering , biology
This paper deals with the GC‐MS investigation of the exhaust gas of atmospheric pressure PE‐CVD processes in organosilicon‐ and fluorocarbon‐containing dielectric barrier discharges. The extent of unreacted monomer and the quali‐quantitative distribution of by‐products have been investigated as a function of the feed composition. The results confirm that GC‐MS is a powerful indirect diagnostic technique of the plasma phase since it allows to hypothesize some of the reactive moieties formed in the plasma and to clarify some aspects of the deposition mechanism (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)