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Microparticle Charge Screening in Non‐Equilibrium Plasmas with Two Types of Positive Ions
Author(s) -
Filippov A. V.,
Derbenev I. N.
Publication year - 2009
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.200910091
Subject(s) - microparticle , ion , plasma , ionization , atomic physics , diffusion , electron , materials science , effective nuclear charge , plasma parameters , physics , nuclear physics , thermodynamics , optics , quantum mechanics
The study of screening a microparticle charge in a plasma taking into account sinks of electrons and ions to the microparticle and bulk processes of their production and loss in a plasma is reported. The research objective is to investigate the effect of the conversion of atomic ions Ar + to molecular ones Ar 2 + on character of screening in a plasma with an external ionization source. It is determined that the plasma due to the ion conversion consists of two positive ion species. This circumstance leads to the three‐exponential charge screening, moreover there exists a region of plasma parameters where all the screening constants have comparable values. Numerical simulation of microparticle charging on the basis of the drift‐diffusion approach is performed and comparison of the obtained data with the analytical results is fulfilled (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)