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Electric Microfield Distributions in Dense One‐ and Two‐Component Plasmas
Author(s) -
Sadykova S.,
Ebeling W.
Publication year - 2007
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.200710075
Subject(s) - pseudopotential , physics , plasma , component (thermodynamics) , symmetry (geometry) , quantum , diffraction , coupling (piping) , atomic physics , quantum mechanics , materials science , mathematics , geometry , metallurgy
The electric microfield distributions have been calculated using an integral‐equation method for one‐component plasmas proposed by Iglesias [1] and the coupling‐parameter integration technique for two‐component plasmas proposed by Ortner et al. [2]. Electric microfield distributions are studied in the frame of the Kelbg pseudopotential model, taking into account quantum‐mechanical effects (diffraction, quantum symmetry effects) and screening effects. The screened pseudopotential is represented in a numerically approximated form. The results are compared with simulation results obtained by other authors. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)