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Formative Time Delay in Nitrogen Discharges at Low Pressure
Author(s) -
Marković V. Lj.,
Stamenković S. N.,
Gocić S. R.
Publication year - 2007
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.200710054
Subject(s) - formative assessment , nitrogen , residual , materials science , plane (geometry) , voltage , nitrogen gas , computer science , mechanics , analytical chemistry (journal) , physics , chemistry , mathematics , algorithm , statistics , chromatography , geometry , quantum mechanics
In this paper the formative time delay in nitrogen was determined from statistically based measurements of electrical breakdown time delay. The measurements were carried out under different conditions on a newlydesigned gas tube with a plane‐parallel electrode system made from copper. The avalanche growth was followed based on a simple analytical model agreeing well with the experimental data. The dependencies of the formative time delay on the working voltage and the electron yields in the interelectrode space originating from residual states were found. A developed approximate model for the formative time delay has shown fits with the experimental data better than other models discussed in the literature. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)