Premium
In‐Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source
Author(s) -
Lee S.H.,
Cho J.H.,
Kim G.H.
Publication year - 2006
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.200610021
Subject(s) - inductively coupled plasma , argon , plasma , materials science , langmuir probe , transformer , atomic physics , inductively coupled plasma atomic emission spectroscopy , voltage , current density , electrical impedance , analytical chemistry (journal) , plasma diagnostics , physics , chemistry , nuclear physics , quantum mechanics , chromatography
The in‐situ monitoring method of plasma density variation in the inductively coupled plasma (ICP) source was developed with the air‐core transformer model using the current and voltage of antenna. The model was modified for the ICP generated by the flat antenna. The collision effect was also considered to obtain the skin depth and plasma impedance. Monitored plasma density was compared to the probe data taken at the center of chamber, showing the good agreement in the density variation with various powers of 100 to 1500 W and the argon operating pressures of 7 to 100 mTorr, respectively. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)