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PECVD of Carbon Nanostructures in Hydrocarbon‐Based RF Plasmas
Author(s) -
Ostrikov K.,
Tsakadze Z.,
Rutkevych P. P.,
Long J. D.,
Xu S.,
Denysenko I.
Publication year - 2005
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.200510057
Subject(s) - plasma , nanostructure , carbon fibers , materials science , plasma enhanced chemical vapor deposition , hydrocarbon , nanoparticle , deposition (geology) , chemical vapor deposition , chemical engineering , substrate (aquarium) , carbon nanoparticles , ionization , nanotechnology , analytical chemistry (journal) , environmental chemistry , chemistry , organic chemistry , composite material , ion , physics , paleontology , oceanography , quantum mechanics , sediment , geology , composite number , engineering , biology
Different aspects of the plasma‐enhanced chemical vapor deposition of various carbon nanostructures in the ionized gas phase of high‐density, low‐temperature reactive plasmas of Ar+H 2 +CH 4 gas mixtures are studied. The growth techniques, surface morphologies, densities and fluxes of major reactive species in the discharge, and effects of the transport of the plasma‐grown nanoparticles through the near‐substrate plasma sheath are examined. Possible growth precursors of the carbon nanostructures are also discussed. In particular, the experimental and numerical results indicate that it is likely that the aligned carbon nanotip structures are predominantly grown by the molecular and radical units, whereas the plasma‐grown nanoparticles are crucial components of polymorphous carbon films. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)