Characterization of a Magnetron Plasma for Deposition of Titanium Oxide and Titanium Nitride Films | Zendy

Hippler R. | Zendy; Wrehde S. | Zendy; Straňák V. | Zendy; Zhigalov O. | Zendy; Steffen H. | Zendy; Tichý M. | Zendy; Quaas M. | Zendy; Wulff H. | Zendy

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Characterization of a Magnetron Plasma for Deposition of Titanium Oxide and Titanium Nitride Films

Author(s) -

Hippler R.,

Wrehde S.,

Straňák V.,

Zhigalov O.,

Steffen H.,

Tichý M.,

Quaas M.,

Wulff H.

Publication year - 2005

Publication title -

contributions to plasma physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.531

H-Index - 47

eISSN - 1521-3986

pISSN - 0863-1042

DOI - 10.1002/ctpp.200510040

Subject(s) - argon , materials science , cavity magnetron , titanium , analytical chemistry (journal) , sputter deposition , plasma , titanium oxide , titanium nitride , deposition (geology) , nitride , substrate (aquarium) , oxide , thin film , atomic physics , sputtering , metallurgy , chemical engineering , nanotechnology , chemistry , physics , layer (electronics) , environmental chemistry , oceanography , engineering , biology , paleontology , quantum mechanics , sediment , geology

Experimental results for the energy distribution of electrons and plasma ions in a magnetron discharge with a titanium target and with pure argon, argon/nitrogen and argon/oxygen mixtures as working gas are reported. Typical electron temperatures measured 6.5 … 9.5 cm above the magnetron target range between 2–3.5 eV. Typical values for the plasma potential are in the 0.4–2 V range, as are mean ion energies measured with the help of energy‐resolved mass spectrometry. Deposited titanium films show some dependencies on oxygen flow and on substrate bias. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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