Premium
Characterization of a Magnetron Plasma for Deposition of Titanium Oxide and Titanium Nitride Films
Author(s) -
Hippler R.,
Wrehde S.,
Straňák V.,
Zhigalov O.,
Steffen H.,
Tichý M.,
Quaas M.,
Wulff H.
Publication year - 2005
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.200510040
Subject(s) - argon , materials science , cavity magnetron , titanium , analytical chemistry (journal) , sputter deposition , plasma , titanium oxide , titanium nitride , deposition (geology) , nitride , substrate (aquarium) , oxide , thin film , atomic physics , sputtering , metallurgy , chemical engineering , nanotechnology , chemistry , physics , layer (electronics) , environmental chemistry , oceanography , engineering , biology , paleontology , quantum mechanics , sediment , geology
Experimental results for the energy distribution of electrons and plasma ions in a magnetron discharge with a titanium target and with pure argon, argon/nitrogen and argon/oxygen mixtures as working gas are reported. Typical electron temperatures measured 6.5 … 9.5 cm above the magnetron target range between 2–3.5 eV. Typical values for the plasma potential are in the 0.4–2 V range, as are mean ion energies measured with the help of energy‐resolved mass spectrometry. Deposited titanium films show some dependencies on oxygen flow and on substrate bias. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)