Use of average value of Langmuir probe characteristic for characterization of pulsed discharges | Zendy

Blažek J. | Zendy; Špatenka P. | Zendy; Taeschner Ch. | Zendy; Leonhard A. | Zendy

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Use of average value of Langmuir probe characteristic for characterization of pulsed discharges

Author(s) -

Blažek J.,

Špatenka P.,

Taeschner Ch.,

Leonhard A.

Publication year - 2003

Publication title -

contributions to plasma physics

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.531

H-Index - 47

eISSN - 1521-3986

pISSN - 0863-1042

DOI - 10.1002/ctpp.200310056

Subject(s) - langmuir probe , characterization (materials science) , plasma , materials science , tin , langmuir , deposition (geology) , chemical vapor deposition , analytical chemistry (journal) , planar , plasma diagnostics , nanotechnology , chemistry , metallurgy , physics , computer science , environmental chemistry , nuclear physics , paleontology , sediment , computer graphics (images) , aqueous solution , biology

Based on numerical calculations a new method has been developed, which enables plasma analysis from the average value of the Langmuir probe current measured in pulsed discharge. The application of this method for characterization of a planar reactor used for plasma enhanced chemical vapor deposition of TiN and (TiAl)N hard coatings is described as an example. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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