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Collision processes of Hydride species in Hydrogen plasmas: III. The Silane family
Author(s) -
Janev R. K.,
Reiter D.
Publication year - 2003
Publication title -
contributions to plasma physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0863-1042
DOI - 10.1002/ctpp.200310055
Subject(s) - dissociation (chemistry) , silane , atomic physics , ion , ionization , hydrogen , electron ionization , propane , electron , hydrogen atom , plasma , proton , hydride , excitation , molecule , materials science , chemistry , physics , nuclear physics , organic chemistry , quantum mechanics , composite material , alkyl
Cross sections are provided for most important collision processes of the Silicon‐Hydrides from the “Silanefamily”: SiH y ( y = 1 − 4) molecules and their ions SiH + y , with (plasma) electrons and protons. The processes include: electron impact ionization and dissociation of SiH y , dissociative excitation, ionization and recombination of SiH + y ions with electrons, and charge ‐ and atom ‐ exchange in proton collisions with SiH y . All important channels of dissociative processes are considered. Information is also provided on the energetics (reactants/products energy loss / gain) of each individual reaction channel. Total and partial cross sections are presented in compact analytic forms. The critical assessment of data, derivation of new data and presentation of results follow closely the concepts of the recently published related databases for Carbon‐Hydrides, namely for the Methane family [1, 2], and for the Ethane‐ and the Propane families [3], respectively. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)