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Plasma‐Beam Discharge with a Pipe‐like Electron Beam as the Generator of Large Flows of Active Radicals
Author(s) -
Atamanov V. M.,
Levadny G. B.,
Ivanov A. A.,
Nasedkin Y. F.,
Sereda Y. V.,
Serov A. A.,
Timchenko N. N.
Publication year - 1982
Publication title -
beiträge aus der plasmaphysik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0005-8025
DOI - 10.1002/ctpp.19820220607
Subject(s) - torr , radical , cathode ray , beam (structure) , plasma , etching (microfabrication) , generator (circuit theory) , materials science , fluorine , atomic physics , electron , silicon , drift tube , plasma etching , chemistry , optics , nanotechnology , optoelectronics , physics , ion , organic chemistry , power (physics) , layer (electronics) , quantum mechanics , metallurgy , thermodynamics
Investigations on the device with a tube‐like electron beam have been carried out. The behaviour of the plasma‐beam discharge in active molecular gases at low pressures and at the pressure P = 1 Torr has been studied. The etching of crystalline silicon by active fluorine radicals has been carried out.