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Parametrische Anregung von elektrostatischen Oberflächenwellen in einer inhomogenen Plasmaschicht durch ein amplituden‐moduliertes UHF‐Pumpfeld
Author(s) -
Aliew Ju. M.,
Gradow O. M.,
Sünder D.
Publication year - 1975
Publication title -
beiträge aus der plasmaphysik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.531
H-Index - 47
eISSN - 1521-3986
pISSN - 0005-8025
DOI - 10.1002/ctpp.19750150303
Subject(s) - ultra high frequency , physics , amplitude , modulation (music) , frequency modulation , parametric statistics , plasma , amplitude modulation , field (mathematics) , atomic physics , optics , acoustics , radio frequency , electrical engineering , quantum mechanics , engineering , statistics , mathematics , pure mathematics
Parametric resonance phenomena are investigated in a plasma layer with thickness d and thin inhomogeneous boundary regions. The modulated UHF electric field is parallel to the plasma layer. We consider both strong and low modulation of the field amplitude and suppose, that the carrier frequency ω 0 of the pump wave is much larger than the Langmuir frequency ω Le . We find the region for the modulation frequency ω, in which the parametric growing of the asymmetric and symmetric surface waves occurs. The maximum growth rates of these waves, the direction of their propagation and the threshold value of the modulation depth α of the UHF pump field are calculation.