z-logo
Premium
Atomic Layer Deposition of Bismuth Vanadates for Solar Energy Materials
Author(s) -
Stefik Morgan
Publication year - 2016
Publication title -
chemsuschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.412
H-Index - 157
eISSN - 1864-564X
pISSN - 1864-5631
DOI - 10.1002/cssc.201600457
Subject(s) - materials science , bismuth vanadate , bismuth , atomic layer deposition , chemical engineering , photoelectrochemistry , inorganic chemistry , water splitting , electrolyte , oxide , layer (electronics) , nanotechnology , electrode , chemistry , metallurgy , electrochemistry , photocatalysis , biochemistry , engineering , catalysis
The fabrication of porous nanocomposites is key to the advancement of energy conversion and storage devices that interface with electrolytes. Bismuth vanadate, BiVO 4 , is a promising oxide for solar water splitting where the controlled fabrication of BiVO 4 layers within porous, conducting scaffolds has remained a challenge. Here, the atomic layer deposition of bismuth vanadates is reported from BiPh 3 , vanadium(V) oxytriisopropoxide, and water. The resulting films have tunable stoichiometry and may be crystallized to form the photoactive scheelite structure of BiVO 4 . A selective etching process was used with vanadium‐rich depositions to enable the synthesis of phase‐pure BiVO 4 after spinodal decomposition. BiVO 4 thin films were measured for photoelectrochemical performance under AM 1.5 illumination. The average photocurrents were 1.17 mA cm −2 at 1.23 V versus the reversible hydrogen electrode using a hole‐scavenging sulfite electrolyte. The capability to deposit conformal bismuth vanadates will enable a new generation of nanocomposite architectures for solar water splitting.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom