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Optimizing the Deposition of Hydrogen Evolution Sites on Suspended Semiconductor Particles using On‐Line Photocatalytic Reforming of Aqueous Methanol Solutions
Author(s) -
Busser G. Wilma,
Mei Bastian,
Muhler Martin
Publication year - 2012
Publication title -
chemsuschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.412
H-Index - 157
eISSN - 1864-564X
pISSN - 1864-5631
DOI - 10.1002/cssc.201200374
Subject(s) - photocatalysis , catalysis , aqueous solution , methanol , semiconductor , water splitting , materials science , hydrogen , hydrogen production , chemical engineering , deposition (geology) , inorganic chemistry , nanotechnology , chemistry , organic chemistry , optoelectronics , paleontology , sediment , engineering , biology
The deposition of hydrogen evolution sites on photocatalysts is a crucial step in the multistep process of synthesizing a catalyst that is active for overall photocatalytic water splitting. An alternative approach to conventional photodeposition was developed, applying the photocatalytic reforming of aqueous methanol solutions to deposit metal particles on semiconductor materials such as Ga 2 O 3 and (Ga 0.6 Zn 0.4 )(N 0.6 O 0.4 ). The method allows optimizing the loading of the co‐catalysts based on the stepwise addition of their precursors and the continuous online monitoring of the evolved hydrogen. Moreover, a synergetic effect between different co‐catalysts can be directly established.