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Diffusion of vacancy‐impirity‐paris in cystalline solids studied by a Monte Carlo simulation
Author(s) -
Fritzsch B.,
Zehe A.
Publication year - 1994
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170290620
Subject(s) - valency , vacancy defect , monte carlo method , electromigration , void (composites) , statistical physics , diffusion , impurity , thermodynamics , materials science , chemistry , condensed matter physics , physics , mathematics , statistics , philosophy , linguistics , organic chemistry , composite material
The joint migration of vacancy‐impurity‐paris (VIPs) in dilute metallic alloys has been used in a previous publication to explain void formation resitance in electromigration experiments for certain combinations. A corresponding rule to based on the valency of matrix and alloying elements. This paper deals with the range of validity of that rule, considering thermodynamic parameters like binding and migration energy as well as temperature, which are incorporated in a Monte Carlo simulation of the migration process of VIPs. Rule exceptions are explained by the outcome of this analysis.