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Structure and growth morphology of RF‐sputtered superthin niobium films
Author(s) -
Mikhailov I. F.,
Borisova S. S.,
Fomina L. P.,
Babenko I. N.,
Melnik N. N.,
Pudonin F. A.
Publication year - 1994
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170290509
Subject(s) - niobium , crystallite , sputtering , materials science , layer (electronics) , reflectometry , morphology (biology) , optics , thin film , analytical chemistry (journal) , chemistry , metallurgy , composite material , nanotechnology , physics , time domain , biology , computer science , computer vision , genetics , chromatography
Superthin niobium films of 3 to 35 Å thickness prepared by radio‐frequency sputtering have been studied by modern X‐ray methods, such as reflectometry, fluorescence analysis and grazing beam structure analysis. It has been shown that the films were polycrystalline and consisted of several layers of niobium oxides and solid solution NbO. Two simple models were used to describe erly stages of film growth. In the stage of island growth the complete oxidation of Nb to Nb 2 O 5 is inevitable. Beginning from effective thickness ∼ 5 Å the deposited film becomes continuous, and further, layer‐by‐layer growth takes place.