Premium
Crystal Structure and Growth Morphology of Nickel Superthin Films
Author(s) -
Mikhailov I. F.,
Borisova S. S.,
Fomina L. P.,
Babenko I. N.,
Melnik N. N.,
Pudonin F. A.
Publication year - 1992
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170270812
Subject(s) - crystallite , nickel , crystallization , morphology (biology) , materials science , reflectometry , crystal growth , sputtering , crystallography , thin film , mineralogy , optics , analytical chemistry (journal) , chemistry , metallurgy , nanotechnology , geology , physics , computer vision , time domain , paleontology , chromatography , computer science , organic chemistry
Abstract Ni superthin films of t = 0.3–3.5 nm thickness prepared by radio‐frequency sputtering have been studied by mordern X‐ray methods, such as reflectometry, fluorescence analysis and grazing‐beam structure analysis. The results have shown that the films were polycrystalline and their densities correspond to bulk values for nickel already at the early stage of growth. None oxides were found in Ni films. The model of earliest stage film growing have been suggested: film begins to grow by the island mechanism, but the crystallization front remains perfectly plane during the growth.