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On the Intensity of Kossel Reflections
Author(s) -
Nolze G.,
Geist V.
Publication year - 1992
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170270321
Subject(s) - intensity (physics) , maxima , line (geometry) , diffraction , wavelength , line width , optics , materials science , physics , molecular physics , chemistry , mathematics , geometry , art , performance art , art history
The line intensity of Kossel reflections of various single crystals (A1, A2, B3, B4 and C16 type of structure) has been studied experimentally as well as theoretically. In contrast to earlier results high excess intensity of experimental Kossel lines can be explained solely by dynamical diffraction effects without an additional consideration of real structure effects. It has been shown that the different maxima of intensities of Kossel lines found above all result from the different line width. depending strongly on the X‐ray wavelength used (λ = 0.47−8.34 Å): Sole convolution of the theoretical profiles partly transforms the differences in the line width into variation of height.