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On Mechanism of Internal Stresses Formation in Electrodeposited Co‐based Alloy Films with Columnar Structure
Author(s) -
Tochitskii T. A.,
Shadrov V. G.,
Boltushkin A. V.
Publication year - 1991
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170260721
Subject(s) - materials science , crystallite , impurity , alloy , crystallization , texture (cosmology) , ultimate tensile strength , stacking , composite material , crystallography , chemical engineering , metallurgy , chemistry , organic chemistry , image (mathematics) , artificial intelligence , computer science , engineering
The internal stresses formed in electrodeposited Co‐based alloy films with columnar structure have been investigated. It is shown that the sign and the value of the stresses are determined by the texture, amount of the adsorbed impurities (CoO and Co(OH) 2 ) and character of their incorporation in the deposit. A preferable crystallite incorporation of the impurities promotes the formation of the tensile stresses through the substraction stacking faults formation. With the crystalline incorporation decreasing, the compression stresses mechanism, caused by the crystallization pressure prevails.