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An Optimized Shutter Position in MBE Equipments with Large Substrates
Author(s) -
Wolf B.,
Zehe A.
Publication year - 1991
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170260123
Subject(s) - shutter , position (finance) , flux (metallurgy) , evaporation , materials science , optoelectronics , optics , physics , metallurgy , finance , economics , thermodynamics
Large heated substrates in industrial MBE application offer the possibility to minimize the influence of shutter motion on the evaporation source temperature by shutter installation at the position of zero net flux of radiation, which is discussed in the present paper.