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On the thermal behaviour of molecular beam effusion sources
Author(s) -
Müller B.,
Wolf B.,
Zehe A.
Publication year - 1990
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170250919
Subject(s) - thermal , evaporation , molecular beam epitaxy , thermal stability , beam (structure) , materials science , molecular beam , optoelectronics , chemistry , nuclear engineering , thermodynamics , nanotechnology , molecule , epitaxy , optics , physics , engineering , organic chemistry , layer (electronics)
Molecular beam epitaxy (MBE) takes advantage of crucibles indirectly heated by an electric resistance heater. These thermal sources can be used to evaporate a great variety of materials. A precise control of the evaporation rate, however, requires a temperature stability of about 1‰. Therefore, a detailed knowledge on the thermal behaviour of the source is indispensible. It is intended to present models describing the response of the source temperature to a step change in heating power and compare the results by experimental data.