On the thermal behaviour of molecular beam effusion sources | Zendy

Müller B. | Zendy; Wolf B. | Zendy; Zehe A. | Zendy

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On the thermal behaviour of molecular beam effusion sources

Author(s) -

Müller B.,

Wolf B.,

Zehe A.

Publication year - 1990

Publication title -

crystal research and technology

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.377

H-Index - 64

eISSN - 1521-4079

pISSN - 0232-1300

DOI - 10.1002/crat.2170250919

Subject(s) - thermal , evaporation , molecular beam epitaxy , thermal stability , beam (structure) , materials science , molecular beam , optoelectronics , chemistry , nuclear engineering , thermodynamics , nanotechnology , molecule , epitaxy , optics , physics , engineering , organic chemistry , layer (electronics)

Molecular beam epitaxy (MBE) takes advantage of crucibles indirectly heated by an electric resistance heater. These thermal sources can be used to evaporate a great variety of materials. A precise control of the evaporation rate, however, requires a temperature stability of about 1‰. Therefore, a detailed knowledge on the thermal behaviour of the source is indispensible. It is intended to present models describing the response of the source temperature to a step change in heating power and compare the results by experimental data.

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