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RHEED investigations of unusual crystalline states in amorphous SiO 2 films
Author(s) -
Peneva S. K.,
Popova L. I.,
Tcukeva E. A.,
Atanassova E. D.
Publication year - 1989
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170240813
Subject(s) - reflection high energy electron diffraction , electron diffraction , microcrystalline , silicon , reflection (computer programming) , materials science , crystallography , rutile , amorphous solid , crystalline silicon , chemical physics , mineralogy , diffraction , chemistry , optics , physics , optoelectronics , programming language , organic chemistry , computer science
Microcrystalline regions of silicon dioxide with structures unobserved in the macro‐state are studied by Reflection High Energy Electron Diffraction (RHEED). Their formation can be understood by considering the existence of several possible relatively stable crystalline states of SiO 2 , with free energies higher than those of the known silicon oxides. SiO 2 with structures and lattices identical to the structures and the lattices of the CaF 2 ‐, of the rutile‐type GeO 2 , and of α‐PbO 2 have been identified. Considerations for the state of silicon in some of these structures are also included.