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Chemical etching and polishing of InP
Author(s) -
Kurth E.,
Reif A.,
Gottschalch V.,
Finster J.,
Butter E.
Publication year - 1988
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170230117
Subject(s) - polishing , x ray photoelectron spectroscopy , etching (microfabrication) , bromine , isotropic etching , chemical state , materials science , methanol , chemical engineering , chemistry , nanotechnology , metallurgy , organic chemistry , layer (electronics) , engineering
This paper describes possibilities of several chemical preparations for the selective cleaning of InP surfaces. The investigations of the surface states after the chemical treatment were carried out by means of XPS measurements. A pre‐etching with (NH 4 ) 2 S 2 O 8 :H 2 SO 4 :H 2 O and a polishing with 1% bromine in methanol produce optically smooth (100)‐ and (111) P surfaces free of oxides.