Premium
METAL CVD: A thermodynamic model
Author(s) -
Cebulla Horst,
Erben Elke
Publication year - 1987
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170220302
Subject(s) - tantalum , chemical vapor deposition , metal , thermodynamics , deposition (geology) , chemistry , vapor pressure , thermodynamic equilibrium , flux (metallurgy) , mole , mole fraction , materials science , organic chemistry , physics , paleontology , sediment , biology
This paper describes a thermodynamic model for the chemical vapour deposition of metal films. The values of the equilibrium mole fractions, the metal mole flux, and the deposition rate were calculated. This dependences are discussed for the normal pressure and low pressure tantalum deposition. Experimental values are reported and compared with theoretical results.